| 학회 | 한국화학공학회 |
| 학술대회 | 1998년 봄 (04/24 ~ 04/25, KOEX) |
| 권호 | 4권 1호, p.345 |
| 발표분야 | 공정시스템 |
| 제목 | RTP 시스템내의 웨이퍼 온도 균일도를 위한 모델링 및 모사 |
| 초록 | Rapid thermal processing (RTP) emerged as an attractive technology to replaceconventional batch processes in the microelectronics industry for thermalprocessing ofdevices with submicron dimensional constraints. RTP is suitable formulti-chambersystem and can minimize the overall thermal budget of the process byreducing the processing time instead of reducing the temperature. As the wafer sizeincreases,the temperature nonuniformity across the wafer surface becomes serious. Thisstudy considers the problem of controlling a 12 inch RTP system with 5independently-controllable lamp zones. We present a systematic approach to themodeling of the RTP system. In this study numerical techniques are developed for usinga thermal model to find the heat transfer characteristics of the RTP systemand optimizeperformance of temperature control configurations. For minimizing temperature erroracross the wafer during steady state hold, we usedthe optimization method presented byNorman (Norman 1992), which is to solve theminimax problem with linear programming.Optimal lamp settings for each temperaturesetpoint were obtained by this method andthe simulation results using these lampsettings showed about 1.5℃ worst nonuniformity.And applying the optimization method for steady state temperature uniformity, wecouldobtain the lamp power trajectories to minimize worst-case temperature error overbothtime and radial position on the wafer during desired temperature trajectories. Theseoptimization results show that very good temperature uniformity can be achievedfor 12inch RTP system during both steady state and transient state. Theseoptimizationtechniques are potentially valuable not only in control system for given RTPsystemsbut also in design of new RTP systems. Open-loop optimization of lamp zonesettingscan be used to design feedforward lamp power signals for useinopen-loop-plus-feedback systems. |
| 저자 | 박형진, 이정석, 박선원 |
| 소속 | 한국과학기술원 화학공학과 |
| 키워드 | RTP; Modeling; Simulation; Optimization |
| 원문파일 | 초록 보기 |
