| 초록 |
Single molecule electronic devices with controlling individual molecules for high charge transport has attracted significant interest in diodes, transistors, switches, memory and sensors. Nano-gap electrodes separated from the molecular scale to the nanometer scale have been central technical challenge for the fabrication of single molecule devices and circuits. We report a new nanofabrication method for realizing large-area tunable nano-gap (20nm, 50nm, 100nm) electrode arrays with high efficiency and reproducibility. This method is the combination with chemical etching and an innovative technique called by secondary sputtering lithography. "Secondary sputtering lithography” enables fabrication of ultrahigh-resolution and high aspect ratio patterns of 3D various shapes. And this large-area nano-gap electrodes in a precise and controllable manner are fully compatible with previous nano-gap fabrication technology. |
