| 초록 |
New copper contained methacrylate monomer and copolymers were synthesized. According to the composition of copolymer, this copolymer is amorphous and soluble to organic solvent or chemical developer like a TMAH aqueous solution. Copper ion in copolymer was easily reduced by chemical, UV and electron beam reduction. Using this property, copper nano film was generated in selective area by UV or electron beam irradiation from the uniformed copolymer film on Si wafer. From the copolymer solution, nanonetwork was prepared by chemical reduction. |
