화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2008년 봄 (04/10 ~ 04/11, 컨벤션 뷰로(대전))
권호 33권 1호
발표분야 기능성 고분자
제목 Photo-curable Negative Resist containing Oxetane moieties for MEMS technology
초록 Micro-electromechanical systems (MEMS) technology encompasses an enormous variety of applications that generally require 3-D patterning of high-aspect ratio microstructures with tightly controlled mechanical properties. About this, SU-8 which consists of bisphenol-A oligomers and epoxy moiety has been developed already and used widely in MEMS technology. Recently in our lab, we developed new materials for MEMS technology, OT-8 which is bisphenol-A oligomers containing oxetane , photo-crosslinkerable moiety. Oxetane is more stable than epoxy so that synthesis process is more tolerable and product after formulation can be stored for long time without change. We synthesized OT-8 products and formulated and evaluated under the I-line exposure. So we got high-aspect ratio microstructures ( line width 5μm, height over 15μm ) with OT-8 and applied to MEMS technology, especially Ink-jet head process.
저자 김수민1, 박병하2, 김진백1
소속 1한국과학기술원, 2삼성전자
키워드 MEMS; negative photoresist
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