| 학회 | 한국공업화학회 |
| 학술대회 | 2008년 가을 (11/12 ~ 11/14, ICC 제주) |
| 권호 | 12권 2호 |
| 발표분야 | 고분자 |
| 제목 | Synthesis of Imide Core UV Monomers and Photoresist Application |
| 초록 | Novel imide monomers were synthesized via two-step process. All reactions were carried out in 250ml three-neck round bottomed flask equipped with nitrogen inlet and outlet and a magnetic stirrer. First, we synthesized precursors based on diamines and anhydrides. In the second step, we used TEA and 4-methoxyphenol MEHQ (200ppm) as a catalyst and and inhibitor respectively for synthesis of novel UV monomers containing imide core. A negative photoresist formulation was developed utilizing synthesized UV monomers containing imide linkage, photoinitiator, UV oligomer, and alkali developable polymer matrix. |
| 저자 | 부광흥, 김진우, 박이순 |
| 소속 | 경북대 |
| 키워드 | negative photoresist; imide monomer; UV monomer; Photolithography |
