| 학회 |
한국고분자학회 |
| 학술대회 |
2011년 봄 (04/07 ~ 04/08, 대전컨벤션센터) |
| 권호 |
36권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Near-UV Sensitive Photo-Patternable Adhesives |
| 초록 |
Photo-patternable adhesives which are sensitive to near-UV light have been newly developed. The new adhesives have dual functional groups. One functional group undergoes the deprotection reaction upon exposure to near UV light. The film in the exposed areas was dissolved in a developer solution. The other functional group crosslinks at elevated temperatures. Therefore, patterned adhesives can be cured to give good thermal and mechanical properties. |
| 저자 |
조영욱1, 김일2, 백경욱2, 김진백1
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| 소속 |
1한국과학기술원, 2한국과학기술원 신소재공학과 |
| 키워드 |
Photo-patterning; Dual-functional; Near-UV; Adhesives; Thermal-curing
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| E-Mail |
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