| 학회 |
한국화학공학회 |
| 학술대회 |
2009년 가을 (10/22 ~ 10/23, 일산 KINTEX) |
| 권호 |
15권 2호, p.2149 |
| 발표분야 |
재료 |
| 제목 |
Poly (styrene-ran-glycidyl methacrylate) as Low-Shrinkage Photoresist forHolographic Lithographically Fabricated 3D Photonic Crystal |
| 초록 |
SU-8, which is commercially available negative-tone photoresist, has been widely used to fabricate micro and submicro-scale structure via photolithography. However, SU-8 templates often suffer from large volumetric shrinkage during post-exposure baking (PEB) and development. This can lead to dimensional distortion, causing photonic crystals (PhC) structures different from the original design and incomplete photonic bandgaps (PBG). Therefore, the fidelity of the final PhC structure is critically dependent on the polymer template. In this study, we reported new photoresist, poly(styrene-ran-glycidyl methacrylate), having low-volumetric shrinkage for fabricating 3D PhC. In our work, 3D PhC was created by holographic lithography using top-cut pyramid prism to prove lower shrinkage than conventional SU-8. |
| 저자 |
전환철1, 박성규2, 허철준2, 한슬기2, 양승만2
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| 소속 |
1한국과학기술원 생명화학공학과 / 한국과학기술원 광자유체집적소자연구단, 2한국과학기술원 생명화학공학과 / 한국과학기술원 광자유체집적소자연구단 |
| 키워드 |
holographic lithography; shrinkage; poly (styrene-ran-glycidyl methacrylate)
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| 원문파일 |
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