초록 |
Along with the rapid advances on the colloidal quantum dot (QD)-based devices, endowing patternable functionality to QDs has been highly desirable to achieve high-resolution QD displays. However, quantum dots are known to be sensitive to heat, moisture and oxidization. In this work, we improved the thermochemical stability of quantum dots by surrounding them with a physical barrier to suppress the creation of surface defects. This protective shell was made using a polymer cross-linkable polymer ligand and was shown to significantly reduce the deleterious effects of exposure to high temperatures and an oxidizing agent. Furthermore, we also demonstrate that an introduction of UV patternable and conducting copolymer ligand to QDs can undergo conventional photolithographic process, readily applicable to high-resolution QD displays with simple processability and cost-efficiency. |