| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 가을 (10/09 ~ 10/10, 일산킨텍스) |
| 권호 |
33권 2호 |
| 발표분야 |
고분자 합성 |
| 제목 |
Synthesis of photoresponsive rod-coil block copolymer through combination of chain growth condensation polymerization and atom transfer radical polymerization |
| 초록 |
Self-assembly of block copolymers and their phase-separated nanostructures have attracted immense interest due to their high potential in the bottom-up lithography. However, it is still challenging to acheive patterns with periods below 20 nm as well as patterns responsive to external stimuli. In this study, we describe a novel condensation-b-addition type rod-coil block copolymer containing azobenzene moieties in the main chain of the rod segment. The block copolymer is expected to exhibit photoresponsive phase-separated structure with the very small domain size. Detailed synthetic routes and characterization for the well-defined block copolymers with narrow polydispersities will be presented, including the chain growth condensation polymerization of azobenzene-containing monomers for the synthesis of the rod segment. |
| 저자 |
허재원, 서명은, 신선희, 김윤준, 김상율
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| 소속 |
KAIST |
| 키워드 |
chain growth condensation polymerization; rod-coil block copolymer
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| E-Mail |
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