| 초록 |
Dry film resist (DFR) is photosensitive film which is generally used for pattern formation through a photolithography process after lamination to the copper sheet of printed circuit board. DFR is made up of a binder polymer and photocurable monomers which are typically based on polyfunctional acrylates. It is cross-linked by exposure to UV light. Stripper is a chemical solution that removes the residual DFR which was used for pattern formation. Most of the conventional strippers are composed of tetramethylammonium hydroxide (TMAH). TMAH is a key component of the conventional strippers. However, TMAH is a toxic material to the human body. We have suggested a novel stripper to replace the TMAH component. The novel stripper is based on organic ammonium hydroxides, amines and glycol ethers. It is less harmful and shows better strip performance than the conventional strippers. Furthermore, we proposed the strip mechanism with analysis of the stripped DFR. |
