화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2011년 가을 (10/06 ~ 10/07, 김대중 컨벤션센터)
권호 36권 2호
발표분야 고분자합성-구조제어중합
제목 Surface-Initiated Atom Transfer Radical Polymerization on Si wafer Surface
초록 In recent years there has been considerable interest in surface initiated polymerization reactions because they allow to modify and control the surface properties of materials to a high extent. In this work, We modified Si wafer surface using atom transfer radical polymerization (ATRP). In here, in order to immobilize initiator for ATRP, we applied micro-contact printing (M-CP) on Si wafers using polydimethylsiloxane (PDMS) stamp made by photolithography. Then, surface of the Si wafer was functionalized with 2-bromo-2-methyl propionic acid and the graft polymerization of N-isopropylacrylamide (Nipaam) was carried out using the CuBr/2,2’-bipyridyl (bpy) system for SI-ATRP. Now that Poly(N-isopropylacrylamide) (PNiPaam) is one of the most popular thermosensitive polymer. In this study, behavior of Nipaam depending on the temperature will be discussed.
저자 길은경, 장아름, 이승우
소속 영남대
키워드 ATRP; N-isopropylacrylamide
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