| 학회 |
한국공업화학회 |
| 학술대회 |
2020년 가을 (10/28 ~ 10/30, 광주 김대중컨벤션센터(Kimdaejung Convention Center)) |
| 권호 |
24권 1호 |
| 발표분야 |
포스터-디스플레이 |
| 제목 |
Catalytic Metals-Accelerated Crystallization of Metal Oxide Semiconductors |
| 초록 |
As an strategy of the high temperature conventional thermal process, catalytic metals-accelerated crystallization (CMAC) process using a metal seed layer was developed for low-temperature crystallization of solution-processed amorphous metal oxide films. As the case study, solution-processed crystalline-TiO2 semiconductor were implemented. The developed CMAC process could effectively suppress crystallization temperature of amorphous-TiO2 films, enabling scalable manufacturing of high-quality semiconducting crystalline-TiO2 film with well-aligned anatase grains and low-defect density. Among the various catalytic metals, thin-Al seed layer could simultaneously provide low-temperature crystallization of solution-processed TiO2 films and the implementation of high-performance solution-processed crystalline-TiO2 TFT. The results reported here argue a facile route to realize low-temperature crystallization of MO semiconductors, offering compatibility with large-scaled applications. |
| 저자 |
신재철1, 조성운2, 권성민1, 조찬호1, 박성규1
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| 소속 |
1중앙대, 2순천대 |
| 키워드 |
Low-Temperature Crystallization; Catalytic Metals-Accelerated Crystallization; Solution-Processed Metal Oxide; Titanium Oxide; Thin-Film Transistor
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| E-Mail |
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