| 학회 |
한국고분자학회 |
| 학술대회 |
2011년 봄 (04/07 ~ 04/08, 대전컨벤션센터) |
| 권호 |
36권 1호 |
| 발표분야 |
고분자가공/복합재료 |
| 제목 |
High Resolution Patterning of Nano-particles with Reusable Perfluoropolyether (PFPE) mold |
| 초록 |
In order to realize patterned nano-particle (NP) arrays, Polydimethylsiloxane (PDMS) molds have frequently been used because of their low adhesion energy and flexibility. However, the modulus of PDMS is too low to apply on high resolution patterning and the PDMS molds swell easily when they are exposed to organic solvents like toluene. Recently, perfluoropolyether (PFPE) - based molds were developed for sub-100 nm patterning with chemical stability to organic solvents. In this presentation, we demonstrate a pattern transfer methodology with a PFPE mold to realize NP arrays. This patterning method offers several advantages over the conventional PDMS molds: It is first applicable to sub-100 nm resolution NP patterning. Second, it is easy to control the coating thickness of NPs in an organic solvent. Furthermore, the used mold is repeatedly recycled based on the detach process with UV-curable adhesive. |
| 저자 |
성승현1, 임재훈2, 윤현식3, 차국헌4
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| 소속 |
1지능형 유도조합체 연구단, 2에너지환경 화학융합기술 전공, 3화학생물공학부, 4서울대 |
| 키워드 |
nano-particle; perfluoropolyether; pattern transfer
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| E-Mail |
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