| 초록 |
Polynorbornene terpolymer (P(NB-r-vinylNB-r-NBMeOH)) was synthesized by vinyl addition polymerization and then thermally labile groups with various molecular weight were grafted to polynorbornene terpolymer backbone for preparation of a low dielectric packaging material. When thermally labile groups in graft copolymer films start to decompose, films thickness also decrease precipitously due to pore collapse. In order to minimize the pore collapse, norbornene triethoxysilylnorbornene random copolymer (P(NB-r-TESNB)) was also synthesized and then blended with graft copolymer. After annealing at 250 ℃(decomposition temperature of the thermally labile group), changes in film thickness were measured for various mole ratio of graft copolymer/P(NB-r-TESNB) blends. And further, we adopted Azido to blend systems to decrease condensation temperature of TES group. The film thickness was measured with ellipsometer and degree of condensation of TES group was observed with FT-IR. The film thickness of blend films is maintained after annealing at 250 ℃, which indicate that vitrification of PNB matrix due to condensation of TES in P(NB-r-TESNB) prevent pore collapse. Pore generated film morphology in cross-sectional view was monitored with FE-SEM. |
