| 학회 |
한국고분자학회 |
| 학술대회 |
2006년 봄 (04/06 ~ 04/07, 일산킨텍스) |
| 권호 |
31권 1호 |
| 발표분야 |
분자전자 부문위원회 |
| 제목 |
Negative Molecular Resists with Calixarene Derivatives for DUV Lithography |
| 초록 |
Negative working molecular resists based on fully epoxy-protected calixarene derivatives have been developed. Calixarenes with hexyl and benzyl groups were synthesized. The epoxy-protected calixarene derivatives were prepared by the reaction of the alkylated calixarene with epibromohydrin in the presence of cesium carbonate. They can be coated on silicon wafers by spin-coating. Films cast from 25 wt% solutions of the derivatives in propylene glycol methyl ether acetate showed high transparency to UV above 300 nm. Negative tone images featuring 0.3 m line and space patterns were observed on the film of the photoresist exposed to 40 mJ/cm2 of DUV-light in contact printing mode. |
| 저자 |
박지영, 김진백, 구세진
|
| 소속 |
한국과학기술원 |
| 키워드 |
negative photoresist; calixarene
|
| E-Mail |
|
