| 학회 |
한국고분자학회 |
| 학술대회 |
2010년 봄 (04/08 ~ 04/09, 대전컨벤션센터) |
| 권호 |
35권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
A Study on photo-curing properties of ladder-type Poly(phenyl-co-methacryl silsesquioxane) (PMASQ) without photo-initiator. |
| 초록 |
Various poly(phenyl-co-methacryl silsesquioxane) (PMASQ) with high molecualr weight (Mw = 10,000~50,000) were synthesized by direct hydrolysis and polymerization in the presence of base catalyst at 25 °C. Obtained PMASQs were analyzed well defined ladder structure and has unique photo-curing properties without photo-initiator. Chemical compositions, molecular weights, and structures of the obtained PMASQ were characterized using 1H NMR, 29Si NMR, FT-IR, and GPC. Before and after photo-curing, physical properties of thin films on Si-wafer were analyzed by a Nanoindentation (Triboindenter system). As a result, elastic modulus values were increased from 0.9GPa to 4.5GPa. |
| 저자 |
최승석1, 이희승1, 이성수1, 백경열1, 최동훈2, 황승상1
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| 소속 |
1한국과학기술(연), 2고려대 |
| 키워드 |
silsesquioxane; photo-curing polymer
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| E-Mail |
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