| 학회 | 한국공업화학회 |
| 학술대회 | 2018년 봄 (05/02 ~ 05/04, 대구 엑스코(EXCO)) |
| 권호 | 22권 1호 |
| 발표분야 | (특별세션) 반도체 공정소재 |
| 제목 | Monitoring Approach of Thin film Processing in Nano Interconnects (나노배선구조에서의 박막공정의 새로운 모니터링 접근 방법) |
| 초록 | Lightweight-miniaturized devices which can surpass the Moore’s Law with multi-functional high performance have been required due to the advent of high-information era and rapid enhancement of state-of-art technology along with the evolution of electronics industry. However, miniaturizing devices within currently allowed area has been facing adversity of physical limits, such as lithography constraints, channel length scaling, degrading process variations, and lithography constraints as well as highly-priced fabrication process. In order to overcome, developing new materials is necessary in order for scaling down has been required. Nano-carbon semiconductors based upon grapheme lines and vertical carbon nanotube (CNT) interconnection have been paid attention as one of the most efficient countermeasures for solving such disadvantages. In this study, we will discuss 5 nm Interconnects and carbon based semiconductor. |
| 저자 | 표성규, 최은미, 최은화, 심호재, 고원 |
| 소속 | 중앙대 |
| 키워드 | 5 nm Interconnects; carbon based semiconductor; Thin film; Monitoring system |
