| 초록 |
Orthogonal photolithography is one of the promising techniques for pixel patterning organic light emitting diodes (OLEDs) using fluorous solvents and fluorinated imaging materials. Due to the immiscibility between fluorous solvents and organic materials, it enables the fluorinated resist film to be deposited on organic charge transporting layers without serious damage. To realize this, resist materials with good solubility in fluorous solvents for lithographic process are needed. Here we synthesized a fluorinated resist with simple synthetic route. Synthesis starts with ring-opening reaction of perfluroalkyl epoxide with α,α,α-Tris(4-hydroxyphenyl)-1-ethyl4-isopropyl-benzene (T-OH) generating a 2° hydroxyl group. Through this reaction, RF-T-OH was synthesized and then this could be converted to tBoc-protected RF-T-OtBoc in presence of (tBoc)2O. With RF-T-OtBoc and fluorous solvents, 30 μm half-pitch OLED pixel arrays could be fabricated. |
