| 초록 |
A novel plasma system has been developed for 3-dimensional surface modification of the carbon nano-powders(CNT, graphene, graphite). Improvement for dispersion of these nano materials was investigated by plasma discharge, not using chemical modification. The plasma process is considered to great advantages over wet chemical process due to environmental, economic viewpoint, and particle’s uniformity. The uniform dispersion is a critical factor for these material's applications of nano composite. Using this plasma system, graphene was nitrogen-treated and functionalized to add a variety of atomic and molecular radicals H, N, NH, and NH2 to graphene. Several key process conditions such as Ar(/H2)/NH3 gas ratio, treatment time, power(voltage), feeder's vibration frequency, and collector condition were investigated. Hydrophobic of graphene has been turned into hydrophilic by NH3 plasma treatment. The nitrogen content ratio on graphene treated by the plasma has increased about 5 times than the untreated one (from Elemental Analysis). Also, N-H peak, C-N peak, and C=N peak data have been detected by FTIR measurement and intensified compared to before-plasma treatment due to NH3 content. |
