| 학회 |
한국공업화학회 |
| 학술대회 |
2016년 봄 (05/02 ~ 05/04, 여수 엑스포 컨벤션) |
| 권호 |
20권 1호 |
| 발표분야 |
화학공정_포스터 |
| 제목 |
Atomic Layer Deposition of iron oxide thin films at low temperatureforcatalysis application |
| 초록 |
Atomic layer deposition has been shown as a promising technique for iron oxide film formation. Iron oxide thin films were extensively used for catalysis applications for numerous industrial reactions.Conformal thin films of iron oxide have been coated on silica by atomic layer deposition. A novel iron based precursor Fe(btmsa)2and Hydrogen peroxide were alternatively dosed in the reactor at 150℃ for film formation. Film conformality and uniformity were verified by transmission electron microscopy. X-ray diffractometry and X-ray photoelectron spectroscopy were utilized as a measure to determine film composition. On annealing the amorphous films becomescrystalline at 550 ℃. The formed iron oxide films were used as photo catalysis for water oxidation reaction. |
| 저자 |
Seenivasan, 김도형, 문희
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| 소속 |
전남대 |
| 키워드 |
Atomic layer deposition; iron oxide; catalysis; thin film
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| E-Mail |
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