| 학회 | 한국화학공학회 |
| 학술대회 | 2003년 가을 (10/24 ~ 10/25, 한양대학교) |
| 권호 | 9권 2호, p.2267 |
| 발표분야 | 에너지/환경 |
| 제목 | Supercritical Water Oxidation of Wastewater from LCD Manufacturing Plant |
| 초록 | The range of LCD products is larger every year and these product make a valuable contribution to different manufacturing industries and, in the end, to our current standard living. However, LCD production also leads to millions of tons of wastewater, and the elimination of these waste is now a key factor for the development of the “green” industry. One remarkably effective process for the treatment and disposal wastewater is supercritical water oxidation (SCWO). In this study, SCWO of the wastewater from a LCD manufacturing plant was carried out in an isothermal, isobaric tubular flow reactor with a H2O2 oxidant. All experiment were performed at pressure 250 bar and at temperature from 395 to 615 oC. At the reactor entrance, the initial chemical oxygen demand (COD) concentrations of wastewater were between 6,88x10-4 and 1,08x10-1 M; the oxidant concentrations were between 1,53x10-2 and 2,69x10-1 M . As the result of experiment, the power-law rate expression that best correlation of the experimental results for the conversion of COD was determined to be: rate = -2.88 x 102 exp(-47.96/RT)[COD]1.01[H2 O2]0.064. |
| 저자 | Veriansyah Bambang, 박태준, 이윤우 |
| 소속 | 한국과학기술(연) |
| 키워드 | SCWO; LCD waste; Kinetic |
| 원문파일 | 초록 보기 |
