| 초록 |
We present that polydopamine assisted interfacial engineering can be synergistically integrated with block copolymer lithography for surface nanopatterning of low-surface-energy substrate materials, including Teflon, graphene, and gold. Block copolymer lithography is a self-assembly based nanopatterning technology that holds great promise for sub-10-nm scale patterning. The directed self-assembly of block copolymers into device-oriented nanopatterns generally requires organic modification of a substrate surface. Consequently, block copolymer lithography could hardly be employed on the aforementioned low surface energy materials. |
