| 초록 |
Nanometer-scale patterning of spin-cast polymer on a silicon substrate has been performed by using the atomic force microscope (AFM). The polymers were synthesized from BPMA(1,3-bis(trimethylsilyl)isopropyl methacrylate), TFMA(tetra-hydrofurfuryl methacrylate) and MAA(methacrylic acid). This polymer showed good thermal stability up to 140 ℃ and good resistance to the HF solution. This polymer had also good stripping property in THF. So we applied this polymer for AFM nanolithography process. As the result, the patterns of several tens nanometer-size were obtained. The characterization of these results was studied by using various techniques such as AFM, LFM and ellipsometry. |
