| 초록 |
The directed self-assembly (DSA) of block copolymers (BCPs) have attracted much attention due to potential applications for sub-20 nm lithography with conventional fabrication processes for integrated circuits. In DSA technique, the phase behavior of block copolymers (BCPs) is dependent on the Flory-Huggins interaction parameter(χ) associated with repulsion between block chains. Therefore, BCPs with large χ value are important to form long-range ordered nanostructure without defects. In this study, new high χ PDVBAM-PMMA BCPs, which are composed of a crystalline hard PDVBAM block, and an amorphous soft PMMA block, were synthesized by RAFT polymerization. Simple solvent annealing of the BCP thin films forms in-plane cylinder or sphere morphology with long range ordering without a guiding template. The self-assembled morphologies were confirmed by AFM, SEM and GISAXS. |
