| 학회 |
한국고분자학회 |
| 학술대회 |
2004년 봄 (04/09 ~ 04/10, 고려대학교) |
| 권호 |
29권 1호, p.354 |
| 발표분야 |
분자전자 부문위원회 |
| 제목 |
Synthesis and characterization of novel photoreactive polymer containing cinnamoyl group |
| 초록 |
Novel photoreactive polymers containing cinnamoyl group were synthesized, which may be applied to many applications such as the field of a photoreactive material for display. The polymers are expected to produce the photolithographic pattern with high optical transmittance and good thermal stability. Chemical structures of the prepared photoreactive polymers were confirmed by 1H-NMR and FT-IR spectroscopies. The photocure behaviors of new photoreactive polymer were investigated using FT-IR and UV-Vis spectroscopies, confirming excellent photoreactivity of the polymers. The photoreactive polymers were dissolved in the appropriate organic solvents with RGB pigments. The solution was spin-coated on a glass substrate, resulting in excellent quality of the thin film about 1 mm. The photoreactive polymer film was irradiated by UV light through a quartz photomask and then developed in an appropriate solvent, leading to the excellent photolithographic pattern. Thermal stability of photocured polymer film was investigated by TGA and UV-Vis spectroscopy. |
| 저자 |
임현순1, 서동교1, 고정민1, 성오현2, 김환건2, 이준영1
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| 소속 |
1성균관대, 2서경대 |
| 키워드 |
Photoreactive polymer; Photolithographic pattern; Photocure behavior
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| E-Mail |
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