| 초록 |
Recently, many researches are in progress to improve the image resolution of PDP. To obtain high resolution in PDP, one of the important factors is to achieve the fine pixel patterns of barrier ribs. Therefore, it is important that the process of barrier rib formation should be designed to have a structure with a high aspect ratio. Photolithographic process can provide the structure wirh a high aspect ratio as well as reducing many processing steps compared to other methods such as the sand blasting and the acid etching. However, the method is required to have a similar refractive index between glass frits and organic components because of the reflection and the scattering by the exposure process. Therefore the refractive index of frit is to be designed to develop a photosensitive paste for the photolithographic process. In this work, we investigated thermal properties and the refractive index of glass frit through the change of silica contents and the frit size in B2O3-Al2O3-SiO2 glasses. It is confirmed that the refractive index of frits is changed by the composition of glasses and the frit size. |
