| 학회 |
한국재료학회 |
| 학술대회 |
2010년 가을 (11/11 ~ 11/12, 무주리조트) |
| 권호 |
16권 2호 |
| 발표분야 |
F. Display and optic Materials and processing(디스플레이 및 광 재료) |
| 제목 |
Improvement of water barrier property of Al2O3/TiO2 multi-layer deposited by plasma enhanced atomic layer deposition on PES substrate |
| 초록 |
A passivation layer consisting of aluminum oxide (Al2O3)/titanium oxide (TiO2) films was deposited onto poly(ether sulfon) (PES) substrate and organic light-emitting diodes (OLEDs) using electron cyclotron resonance atomic layer deposition (ECR-ALD). The effects of plasma power and deposition temperature on the properties of Al2O3 films density were investigated. To enhance the densities and growth rates of the Al2O3 films, a high power plasma process was used in this study. A 10-nm-thick TiO2 buffer layer was deposited prior to the processing of Al2O3 films to avoid PES surface destruction during the high power plasma process and to provide for the defect decoupling effect. The 10-nm-thick TiO2 buffer layer induced 30-nm-thick Al2O3 films, resulting in a water vapor transmission rate (WVTR) value that was lower than the detection limit of the MOCON instrument test (at 38°C, 100% relative humidity). The passivation performances of the Al2O3/TiO2 films were also investigated using OLEDs. The lifetime of the passivated OLEDs was maintained at 50% of the initial luminance for 118.8 hours, while that of the uncoated OLEDs remained at 50% of the initial luminance for 6.6 hours. |
| 저자 |
권태석1, 문연건2, 김웅선2, 문대용1, 김경택3, 박종완3
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| 소속 |
1한양대 나노 반도체공학과, 2한양대 신소재공학관, 3한양대 신소재공학과 |
| 키워드 |
passivation layer; water vapor transmission rate; OLEDs; atomic layer deposition
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| E-Mail |
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