| 학회 | 한국화학공학회 |
| 학술대회 | 2016년 가을 (10/19 ~ 10/21, 대전컨벤션센터) |
| 권호 | 22권 2호, p.1507 |
| 발표분야 | 공업화학 |
| 제목 | Iron Oxide Grown by Atomic Layer Deposition at Low Temperature |
| 초록 | Conformal thin films of iron oxide have been coated on single crystalline silica through atomic layer deposition. A novel iron based precursor Fe(btmsa)2 and Hydrogen peroxide co-reactant were alternatively dosed for film formation. The deposition temperature have great influence on growth rate, and optimum deposition temperature has been found as 150-175℃. Film conformality and uniformity were verified by transmission electron microscopy. X-ray diffractometry and X-ray photoelectron spectroscopy were utilized as a measure to determine film composition. The grown films were amorphous, on annealing the films become crystalline at 550℃. The formed iron oxide films were used as photo anodes for water oxidation reaction. Keywords : Atomic layer deposition , iron oxide, photo anode, thin film |
| 저자 | Seenivasan Selvaraj, 김도형, 문 희 |
| 소속 | 전남대 |
| 키워드 | 화공소재 |
| 원문파일 | 초록 보기 |
