| 학회 |
한국고분자학회 |
| 학술대회 |
2014년 봄 (04/10 ~ 04/11, 대전 컨벤션센터) |
| 권호 |
39권 1호 |
| 발표분야 |
고분자가공/복합재료- 미래 자동차용 고분자소재 최신기술 동향 |
| 제목 |
High transparent complex Moiré superlattice structure with 10nm resolution: From fabrication to selective liquid trapping application |
| 초록 |
Complex lateral superlattice structures can be used in their potential applications such as opto-electronic and nano-biotechnology devices. Among the methods available for fabricating complex lateral superlattice with high resolution and high throughput, moiré fringe approach resulting from the mismatch of two gratings is particularly interesting, since micro-and nanoscale patterns and complex superstructure can be easily fabricated by simple rotation of periodic layer. In this research, we have developed a new procedure for the construction of high transparent complex moiré superlattice structures with 10nm resolution through secondary sputtering lithography (SSL) technique. This simple, rapid and versatile superlattice fabrication process offers the potential for multi-functions and multi-materials by means of moiré fringe technique of secondary sputtering lithography with unique shape that is difficult to achieve with previous lithographic techniques. |
| 저자 |
조수연, 전환진, 김종선, 옥종민, 정희태
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| 소속 |
한국과학기술원 |
| 키워드 |
nanopattern; moiré pattern; secondary sputtering lithography; self-assembly; superlattice
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| E-Mail |
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