화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2004년 봄 (04/09 ~ 04/10, 고려대학교)
권호 29권 1호, p.351
발표분야 분자전자 부문위원회
제목 Non-shrinkable photoresists based on camphor for ArF lithography
초록 The present papers describes a novel class of polymers containing 7,7-dimethyloxepan-2-one acid labile group. The 7,7-dimethyloxepan-2-one group of the matrix polymer was readily cleaved and the carboxylic acid functionality was formed by acid-catalyzed ring-opening reaction in the exposure region after post-exposure bake. The 7,7-dimethyloxepan-2-one group is synthesized from camphor by Bayer-Villiger oxidation. Sub-0.5 μm line and space pattern were obtained at a dose of 10 mJ/cm2 with a conventional developer using an DUV exposure tool.
저자 김진백, 오태환, 허윤희
소속 한국과학기술원 화학과
키워드 Non-shrinkable resist; camphor
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