| 학회 |
한국공업화학회 |
| 학술대회 |
2008년 가을 (11/12 ~ 11/14, ICC 제주) |
| 권호 |
12권 2호 |
| 발표분야 |
고분자 |
| 제목 |
A Novel Negative Photoinitiator-free Photosensitive Polyimide with a Low Dielectric Constant |
| 초록 |
This article describes the preparation of a kind of photoinitiator-free photosensitive polyimide(PSPI) that decreased in the dielectric constant . A soluble aromatic polyimide was acrylated via a reaction with acryloyl chlroride in the presence of triethyl amine to produce a new starting material for the modification of aromatic polyimides. photosensitive properties study revealed its good photolithographic properties. |
| 저자 |
전지희, 최준석, 최봉구, 한학수
|
| 소속 |
연세대 |
| 키워드 |
photosensitive polyimide; photoiniator-free; dielectric constant; lithography;
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| E-Mail |
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