| 학회 |
한국재료학회 |
| 학술대회 |
2017년 봄 (05/17 ~ 05/19, 목포 현대호텔) |
| 권호 |
23권 1호 |
| 발표분야 |
G. 나노/박막 재료 분과 |
| 제목 |
Anti-reflection structure of TiO2 and Al2O3 grown by atomic layer deposition |
| 초록 |
Anti-reflection (AR) coating is crucial to reduce the surface reflection and therefore to maximize the solar cell efficiency in Si solar cells. AR coatings have been generally prepared by sputtering, electron-beam evaporator, and plasma-enhanced chemical vapor deposition (PECVD), but these methods suffer from poor reproducibility in the films’ thickness. In this study, we used atomic layer deposition to grow Al2O3 and TiO2 AR coatings, maximizing the advantage of ALD’s precise thickness control. Fundamental growth behaviors and the optical properties of ALD-Al2O3 and TiO2 films on Si substrates will be studied in conjunction with the simulation results using Macleod software. |
| 저자 |
Yong Tae Kim1, Jaeyeong Heo2
|
| 소속 |
1Department of Materials Science and Engineering, 2and Optoelectronics Convergence Research Center |
| 키워드 |
Anti-reflection coating; atomic layer deposition |
| E-Mail |
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