| 학회 |
한국재료학회 |
| 학술대회 |
2017년 가을 (11/15 ~ 11/17, 경주 현대호텔) |
| 권호 |
23권 2호 |
| 발표분야 |
G. 나노/박막 재료 분과 |
| 제목 |
Double layer anti-reflection coating using Al2O3 and TiO2 on Si substrate |
| 초록 |
Anti-reflection (AR) coating is crucial to reduce the surface reflection and therefore to maximize the solar cell efficiency in Si solar cells. AR coatings have been generally prepared by sputtering, electron-beam evaporator, and plasma-enhanced chemical vapor deposition (PECVD), but these methods suffer from poor reproducibility in the films’ thickness. In this study, we used atomic layer deposition to grow Al2O3 and TiO2 AR coatings, maximizing the advantage of ALD’s precise thickness control. Fundamental growth behaviors and the optical properties of ALD-Al2O3 and TiO2 films on Si substrates will be studied in conjunction with the simulation results using Macleod software. |
| 저자 |
Yong Tae Kim1, Jaeyeong Heo2
|
| 소속 |
1Department of Materials Science and Engineering, 2and Optoelectronics Convergence Research Center |
| 키워드 |
Anti-reflection coating; Silicon solar cell; atomic layer deposition |
| E-Mail |
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