초록 |
Extremely aligned nanolines of poly(tetrafluoroethylene) (PTFE) having sub-100 nm in pitch and 25 nm in height were produced by rubbing the PTFE bar on Si substrates. The dimension of PTFE nanolines could be precisely controlled by varying temperatures and rates of PTFE rubbing. These nanolines were used as etching masks to produce hard surface patterns by RIE process, so that highly aligned Si nanolines having identical dimension with it of PTFE nanolines were fabricated. Then, polystyrene-block-poly(2-vinylpyridine) copolymers (PS-b-P2VP) with a variety of molecular weights were spin-coated and solvent annealed to induce microphase separation. By controlling annealing condition, it was observed that P2VP cylinders oriented either vertically or horizontally in BCP thin films were effectively guided by the underlying nanolines over the whole surface area. In addition, these highly ordered BCP thin films were used as templates to synthesize various metallic nanoparticles in large area. |