| 초록 |
The TCOs most widely used in optoelectronic devices, flat panel display applications are crystalline indium tin oxide, amorphous indium tin oxide, as it combines good electrical conductivity in the visible range. However, a stable supply of ITO may be difficult to achieve for the recently expanding market for optoelectronic devices because of the cost and scarcity of indium, the principal material of ITO. To obtain improved transparency with a good electrical conductivity, new TCO materials have been developed as alternatives to the commercial ones. For a solution to these problems, extensive studies have been carried out on partially substituted compounds of ZnO. Al doped ZnO (AZO) is widely studied in TCOs materials as it shows good electrical, optical, and luminescent properties. Many deposition techniques were applied to synthesize ZnO thin films . However, these conventional thin film deposition methods have several disadvantages. In order to overcome these problems, we have designed LSMCD method. In this study, we focused on the fabrication of aluminum-doped ZnO thin films using the LSMCD at low temperature. |
