| 학회 | 한국화학공학회 |
| 학술대회 | 2008년 봄 (04/23 ~ 04/25, 제주ICC) |
| 권호 | 14권 1호, p.1196 |
| 발표분야 | 재료 |
| 제목 | Modification of photosensitive Polyvinylsilazane for pattering by photolithography |
| 초록 | A highly photosensitive isocyanatodiacrylate, a precursor for ceramic was synthesized by the reaction of polyvinylsilazane with 1,1-bis(acryloloxyethyl)ethyl isocyanate and the chemicals changes in this reaction were investigated by 1H-NMR and FT-IR Spectroscopy for the identification of the precursor. The functionalization of polyvinylsilazane with isocyanatodiacrylate gave a high sensitivity against to UV ray so that the technique of ultravilet nanoimprint lithography was readily available for the one-step fabrication of 3D or multilevel nano/microsturctures with this precursor. The isocyanatodiacrylate moiety increased the sensitivity in UV-NIL which imprinted the fine structures through single-step multilayered stamping onto a UV-curable resist coated on a substrate with no identifiable damage. |
| 저자 | 유향임, 김동표 |
| 소속 | 충남대 |
| 키워드 | Polyvinylsilazane; photolithography |
| 원문파일 | 초록 보기 |
