화학공학소재연구정보센터
학회 한국공업화학회
학술대회 2022년 봄 (05/11 ~ 05/13, 제주국제컨벤션센터(ICC JEJU))
권호 26권 1호
발표분야 포스터-고분자
제목 The effects of Al capping layer on the oxide TFTs by using the Parylene dielectric layer​
초록  Nowadays, the mobility of commercially used top-gate oxide TFTs is not sufficient for driving a high-resolution display. In this article, we suggest the strategy to boost the mobility of Zn-Ba-Sn-O transistors with top-gate structure. The metal-capped layer on semi-conductor can accelerate the transfer of electrons from source to drain. As the interface between the semi-conductor and dielectric layer should be excellent quality, the poly-monochloro(para-xylylene), also known as a PPx-C, was used for the dielectric layer with pinhole, defect-free by a Chemical Vapor Deposition(CVD) method. As a result, we confirmed that the mobility of the ZBTO TFTs was increased by about four times or more (~95 cm2/Vs) compared to before capping. Our group considered that the increased ZBTO TFTs mobility derived from the excellent interface and the role of Al capping layer injecting the electrons.

 
저자 이건오, 박지민, 노병일, 이경진
소속 충남대
키워드 Parylene CVD; TFT Dielectric Layer; Al capping
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