| 초록 |
Chemical vapor deposition (CVD) has been utilized to grow graphene due to advantages such as controllable layer thickness, and large-area growth. Ni has been widely used as the metal catalyst for graphene growth in chemical vapor deposition (CVD), due to its advantages of controllable thickness and low cost. For the transfer of such graphene films onto a target substrate, conventional methods use acid wet etching to remove the metal substrate, which is cost-ineffective as a new Ni catalyst is required for every growth cycle. Herein, we have developed a dry transfer method to delaminate graphene films simply using polymer adhesives. By increasing the adhesive binding force between graphene and the transfer agent, the entire graphene film can be easily delaminated mechanically. Also, this allows the recycled use of Ni catalysts for multiple graphene growth cycles, and graphene films can be repeatedly transferred to various substrates from a single catalyst using this method. |
