| 학회 |
한국공업화학회 |
| 학술대회 |
2018년 가을 (10/31 ~ 11/02, 제주국제컨벤션센터(ICC JEJU)) |
| 권호 |
22권 2호 |
| 발표분야 |
디스플레이_포스터 |
| 제목 |
투명기판에서의 나노임프린팅을 이용한 패턴 전사 및 투과율 측정 |
| 초록 |
The film with nano-structures of subwavelength anti-reflection structures (SAS) is a promising approach to eliminate surface reflection in the fields of solar cell, light emitting diode, and display without a conventional anti-reflection layer. This might lead to both an increase in efficiency and a reduction in the manufacturing costs. The SAS surfaces are generally comprised of periodic or stochastic patterns of a few hundreds of nanometer scale. In this paper, we investigated the transmittance of a several of film with SAS patterned by nano-imprinting litho. technology. As a result, we have observed the changes of the transmittance of the film using UV-VIS spectrophotometers and the nano-scale patterns on the surface of the film using SEM. Finally, these films are fabricated at a low cost and by using the simple process, and may contribute to improving the efficiency of optical devices. |
| 저자 |
장환수1, 조성우1, 김기희1, 이봉호1, 유영진2, 이지원3, 송영민2
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| 소속 |
1대구경북과학기술원, 2광주과학기술원, 3현대자동차 |
| 키워드 |
나노임프린팅; 투과율; 나노패터닝
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| E-Mail |
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