| 학회 |
한국고분자학회 |
| 학술대회 |
2007년 가을 (10/11 ~ 10/12, 일산킨텍스) |
| 권호 |
32권 2호 |
| 발표분야 |
나노구조제어 및 분석기술 |
| 제목 |
Baro-Lithography using Block copolymer with Baroplasticity |
| 초록 |
Block copolymer with baroplasticity can be easily processed at a relatively low temperature under moderate pressure. In this work, polystyrene-block-poly(n-pentylmethacrylate)[PS-b-PnPMA] was used for the nano-scale pattern. We found that the PS-b-PnPMA thin film was easily patterned even by AFM probe at room temperature. Acknowledgement: This work was supported by Creative Research Initiative Program supported by KOSEF |
| 저자 |
조아라1, 주원철2, 김진곤2
|
| 소속 |
1포항공대, 2포항공과대 |
| 키워드 |
Block copolymer; baroplasticity; lithography
|
| E-Mail |
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