| 초록 |
Transparent, flexible and stretchable electrode is an essential part to soft electronics. Not only the materials but also the structures of the electrode are developed to achieve high flexibility with low sheet resistance and high optical transmittance. In previous researches, random network or ordered grid pattern was introduced to offer transmittance and flexibility to metal structure. Graphite grid was also fabricated with CVD on nickel mesh catalyst. In this study, we introduce stencil lithography to fabricate graphite grid. For this work, graphite was synthesized on nickel by CVD technique, transferred to flexible substrate and exposed to oxygen plasma under metal mesh mask. The change of transmittance and sheet resistance with the variation of etching time was observed. We searched the optimal etching time and the optimal case of graphite grid was characterized. |
