| 초록 |
Materials with photonic band gap (PBG), periodic dielectric structures where the propagation of a certain frequency range of light is forbidden, have been extensively investigated for their potential applications in various fields of science and technology including sensors, a component of display devices and photoelectronic devices. It is generally acknowledged that patterning with PBG materials is required for such applications as well as fine modulation of optical properties. In this work, we report a facile approach for creating patterns on block copolymer photonic gels in micron scale. We demonstrate that light sensitive photonic gels assembled from polystyrene-b-poly(2-vinyl pyridine) block copolymers can be directly crosslinked by UV exposure and form micro-patterns. |
