| 학회 |
한국고분자학회 |
| 학술대회 |
2004년 가을 (10/08 ~ 10/09, 경북대학교) |
| 권호 |
29권 2호, p.324 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Nanoporous Organosilicate Films Using Chemically Reactive Nanoparticle |
| 초록 |
To develop the next generation (50 nm) semiconductor chips, dielectric materials containing closed nanoscale pores are required in addition to their low dielectric constants and good mechanical properties. Although many sacrificial materials (porogen) have been studied to introduce nanopores in the dielectric films, the weak interphase interaction between a porogen and a matrix resulted in micro-sized pores and poor mechanical strength. To acquire chemical bonding at the interphases we synthesized triethoxysilyl cyclodextrin (TESCD) as a porogen and used methyl trimethoxy silane-bis triethoxy silane ethane (MTMS-BTESE) copolymer as an organosilicate matrix. The hybrid films exhibited great compatibility up to 60 vol% of porogen loading with the linear increase in the porosity. The nanoporous copolymer showed the dielectric constant as low as 2.0 along with an excellent elastic modulus (∼6 GPa) and well dispersed nanopores. This remarkable result was related to the nanoparticular shape of the porogen and its chemical bonding with the matrix, which inhibited macro-phase separation by nucleation and growth mechanism. |
| 저자 |
신재진1, 민성규1, 문봉진1, 윤도영2, 이희우3
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| 소속 |
1서강대, 2서울대, 3서강대 화공생명공학과 |
| 키워드 |
초저유전절연막; 나노입자; 포라젠; 상용성
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| E-Mail |
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