| 학회 |
한국고분자학회 |
| 학술대회 |
2002년 봄 (04/12 ~ 04/13, 서울대학교) |
| 권호 |
27권 1호, p.311 |
| 발표분야 |
특별 심포지엄 |
| 제목 |
Positive Photosensitive Polyimide End-Capped with Ethynyl Group for a High-Aperture-Ratio TFT-LCD |
| 초록 |
Polyimide containing alicyclic structure has been widely used as materials for liquid crystal display device on their own advantages such as excellent thermal property, high transmittance and electrical property, etc. However, most of alicyclic polyimide has poor chemical resistance for polar organic solvents, which limits its wide application. The present work was undertaken to synthesize colorless positive type photosensitive polyimide end-capped with curable ethynyl group. Chemical resistance of patterned polyimide layer was improved remarkably. Further, properties of polyimides such as dielectic constant, heat resistance as well as photo-sensitivity were investigated.
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| 저자 |
이미혜1, 김효주2, 최길영, 김광규*, 김경준*
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| 소속 |
1한국화학(연), 2*(주) LG 화학 기술(연) |
| 키워드 |
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| E-Mail |
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