| 학회 |
한국고분자학회 |
| 학술대회 |
2003년 봄 (04/11 ~ 04/12, 연세대학교) |
| 권호 |
28권 1호, p.272 |
| 발표분야 |
분자전자 부문위원회 |
| 제목 |
Diffraction efficiency of photopolymer film containing aromatic dimethacylate and acrylate in polysulfone |
| 초록 |
Photopolymers have been found to be very attractive for holographic storage materials because of their high sensitivity, ease of preparation and self-development capability. New photopolymer film was prepared by dispersing a high refractive index dimethacrylic monomer and phenylacrylate in a polysulfone matrix. Photopolymer films having visible light sensitivity could be fabricated in thickness up to ~300 mm. Photopolymerization rates were determined by photo-DSC. Plane-wave-grating holograms were written into the photopolymer films by interfering two collimated plane wave beam of 532 nm diode laser. The temporal growth of the diffracted power was monitored in real-time with a readout beam at 785 nm laser. High diffraction efficiency up to ~70% was obtaining from the photopolymer film. |
| 저자 |
이효원;박지영;김은경 |
| 소속 |
한국화학(연) |
| 키워드 |
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| E-Mail |
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