| 학회 | 한국재료학회 |
| 학술대회 | 2006년 가을 (11/03 ~ 11/03, 수원대학교) |
| 권호 | 12권 2호 |
| 발표분야 | 전자 재료 |
| 제목 | The Role of Energetic Particle Bombardment in Deposition of Thin Film Oxide Phosphors by Sputtering |
| 초록 | Sputtering is a conceptually and experimentally simple, yet highly versatile tool for deposition of thin film oxide phosphors. In particular, energetic particles involved in sputtering process can significantly affect the luminescent characteristics and properties of the deposited oxide phosphor films. Sputtering at low pressure is one of the most convenient ways to enhance the energetic particle bombardment since the energy and directionality of the particles impinging on the growing oxide phosphor films can be qualitatively controlled by judiciously manipulating the sputtering gas pressure. In this study thin film ZnGa2O4:Mn oxide phosphors were deposited by radio frequency magnetron sputtering in an argon-oxygen gas mixture at gas pressures ranged from 2 to 20 mTorr. It was observed that the sputtering gas pressure had dramatic effects on the crystalline structure, surface morphology, and luminescence intensity for both as-deposited and post-deposition annealed films. The experimental results from the present study suggested that sputtering at low pressure enhances the energetic particle bombardment and thus the proper choice of gas pressure enables an optimization of the luminescence and properties of thin film oxide phosphors deposited by sputtering. *This research was supported by the Korea Research Foundation Grant (KRF 2005-041-D00390). |
| 저자 | Cho Yeon Lee1, Jin Hong Heo2, Joo Han Kim1 |
| 소속 | 1Department of Advanced Materials Engineering, 2Chungbuk National Univ. |
| 키워드 | sputtering; thin films; oxide phosphors |
