| 초록 |
Microstructures were produced on curved and sphere surface through hot-embossing by using thin PDMS film which is elastic enough to cover the curved surface without detachment. This method is simple and convenience to pattern curved surface directly, which is difficult to produce using conventional photolithography, especially at sub-micrometer feature sizes, for several reasons. The results show that various patterns are successfully fabricated the sub-micron features as small as 170nm without defect over large area. This method would be useful in a number of areas of optics and optoelectronics. |
