| 학회 |
한국고분자학회 |
| 학술대회 |
2003년 가을 (10/10 ~ 10/11, 부경대학교) |
| 권호 |
28권 2호, p.390 |
| 발표분야 |
의료용 고분자 부문위원회 |
| 제목 |
Negative Resists Based on Acid-catalyzed Acetalization |
| 초록 |
Novel water-developable negative resists were designed to induce both cross-linking and polarity change upon exposure and bake. The matrix polymers were synthesized by copolymerization of glyceryl methacrylate and methacrolein. The acid-catalyzed acetalization of the polymer induced cross-linking, polarity change, and increase in dry-etch resistance. The resist formulated with this polymer and cast in a water-ethanol mixture, showed 0.7 μm line and space patterns using a mercury-xenone lamp in a contact printing mode and pure water as a developer.
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| 저자 |
김진백1, 장지현1, 고종성2
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| 소속 |
1한국과학기술원 화학과, 2한국과학기술원 신소재공학과 |
| 키워드 |
water-developable; cross-linking; 193-nm photoresist
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| E-Mail |
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