| 초록 |
The arrangement of the microdomains in block copolymers changes significantly when they are confined at certain geometric constraint. Here, we study the arrangement of microdomain structures of lamellar-forming polystyrene-block-poly(methyl methacrylate) copolymer (PS-b-PMMA) confined at hemisphere cavities, which covered by polymer films or solvents. We used anodic aluminum oxide (AAO) as a hemi-sphere template. The inner wall of the AAO was modified with three different brushes: (1) PS, (2) PMMA, and (3) PS-random-PMMA copolymer. Then, two kinds of external conditions are given; one is being covered by polymer film (PS, PMMA, PS-ran-PMMA) and the other is solvent annealing (cyclohexane, acetone, THF). The microdomains of PS-b-PMMA with different external conditions show interesting morphologies via transmission electron microscopy (TEM). |
