| 학회 | 한국공업화학회 |
| 학술대회 | 2021년 가을 (11/03 ~ 11/05, 대구 엑스코(EXCO)) |
| 권호 | 25권 2호 |
| 발표분야 | 포스터-에너지저장·변환 |
| 제목 | Atomic layer deposition of zirconia for thin film solar cells passivation layer |
| 초록 | ZrO2 (Zirconia) is a dielectric with relatively wide band gap, high refractive index and high dielectric constant, high breakdown field. These properties make ZrO2 very attractive for the optical and electronic applications. In this study, we demonstrated the ZrO2 ALD process based on tris(dimethylamino)cyclopentadienylzirconium CpZr(NMe2)3 and water. At a growth temperature of 300℃, we have obtained tetragonal ALD ZrO2 conformal films with proper growth rate and low impurity concentrations. |
| 저자 | 이재백, 김대환, 성시준, 양기정, 강진규 |
| 소속 | 대구경북과학기술원 |
| 키워드 | ALD; zirconia; passivation |
